undefined | Better HN

0 pointsnewswasboring1mo ago0 comments

All of these problems or equivalent still exist in EUV. Litho industry had to kind of rethink the source and scanner because it went from all lenses to all mirrors in EUV. This is also why low NA and high NA EUV scanners were different phases.

As I hear it, the decision had large economic component related to Masks and even OPC.

0 comments

itishappy1mo ago

100%. EUV barely works. XRay litho takes all the issues with EUV and cranks them up to 11. It will take comparable effort to EUV, if not more, to get XRay litho up and running, and I'm not aware of anyone approaching this to anywhere near the level of investment that ASML (and others) have pumped into developing EUV tech. We may get there eventually as a species, but we're a ways off.

newswasboringOP1mo ago

If you think it barely works now, you should've seen it when we first started. Availability of a machine was "fuck you"% and the whole system was held together by duct tape, bubblegum and hope. Compared to that the current system is entirely controllable.

itishappy1mo ago

Oh, for sure, via herculean effort and investment we have created ourselves a functioning and economical process!

We do actually have functioning processes for XRay litho today, but we'll need that same level (or more) of investment and effort to make it economical.

j / k navigate · click thread line to collapse

0 pointsnewswasboring1mo ago0 comments

As I hear it, the decision had large economic component related to Masks and even OPC.

0 comments

itishappy1mo ago

newswasboringOP1mo ago

itishappy1mo ago

Oh, for sure, via herculean effort and investment we have created ourselves a functioning and economical process!

We do actually have functioning processes for XRay litho today, but we'll need that same level (or more) of investment and effort to make it economical.

j / k navigate · click thread line to collapse