Not to my knowledge. But new processors solve the problem differently, by running active code very fast on very small feature size lithography, and then entering deep sleep to achieve really low duty cycles. They do really well, achieving impressive numbers of microwatts per MHz:

https://www.eembc.org/ulpmark/ulp-cp/scores.php

I expect that if you wrote code using the power management features of modern platforms, you'd blow that sapphire process on an obsolete node size out of the water.

No idea whether a modern node size on that low-leakage substrate would be any better if it existed...